JPH0423372B2 - - Google Patents
Info
- Publication number
- JPH0423372B2 JPH0423372B2 JP4818387A JP4818387A JPH0423372B2 JP H0423372 B2 JPH0423372 B2 JP H0423372B2 JP 4818387 A JP4818387 A JP 4818387A JP 4818387 A JP4818387 A JP 4818387A JP H0423372 B2 JPH0423372 B2 JP H0423372B2
- Authority
- JP
- Japan
- Prior art keywords
- emitter
- tank
- ion source
- high voltage
- gas phase
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000605 extraction Methods 0.000 claims description 10
- 239000003507 refrigerant Substances 0.000 claims description 9
- 239000000615 nonconductor Substances 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 description 19
- 239000001307 helium Substances 0.000 description 16
- 229910052734 helium Inorganic materials 0.000 description 16
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 16
- 239000007789 gas Substances 0.000 description 15
- 239000007788 liquid Substances 0.000 description 12
- 239000012212 insulator Substances 0.000 description 11
- 229910052594 sapphire Inorganic materials 0.000 description 5
- 239000010980 sapphire Substances 0.000 description 5
- 230000015556 catabolic process Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- MUJOIMFVNIBMKC-UHFFFAOYSA-N fludioxonil Chemical compound C=12OC(F)(F)OC2=CC=CC=1C1=CNC=C1C#N MUJOIMFVNIBMKC-UHFFFAOYSA-N 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- SWQJXJOGLNCZEY-BJUDXGSMSA-N helium-3 atom Chemical compound [3He] SWQJXJOGLNCZEY-BJUDXGSMSA-N 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000002164 ion-beam lithography Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
- H01J2237/0802—Field ionization sources
- H01J2237/0807—Gas field ion sources [GFIS]
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4818387A JPS63216248A (ja) | 1987-03-03 | 1987-03-03 | ガスフエ−ズイオン源 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4818387A JPS63216248A (ja) | 1987-03-03 | 1987-03-03 | ガスフエ−ズイオン源 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63216248A JPS63216248A (ja) | 1988-09-08 |
| JPH0423372B2 true JPH0423372B2 (en]) | 1992-04-22 |
Family
ID=12796270
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4818387A Granted JPS63216248A (ja) | 1987-03-03 | 1987-03-03 | ガスフエ−ズイオン源 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63216248A (en]) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0722842Y2 (ja) * | 1989-07-20 | 1995-05-24 | 株式会社島津製作所 | イオン源 |
| CN102789946B (zh) * | 2011-05-16 | 2016-01-13 | 中国电子科技集团公司第三十八研究所 | 粒子源 |
-
1987
- 1987-03-03 JP JP4818387A patent/JPS63216248A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63216248A (ja) | 1988-09-08 |
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